FEI Nova NanoSEM 630
- Schottky field emitter with up to 100 nA
- 150 mm x 150 mm piezo driven stage
- substrates up to 200mm can be loaded
- ultra high resolution imaging under high and low vacuum
- High vacuum 1.0 nm @ 15kV and Low Vacuum 1.8 nm @ 3kV
- Non conducting substrates can be imaged without coatings
- Electrostatic beam blanker and ebl capability
- Several detectors including TLD, ETD, Helix, VCD, GAD
- Integrated CCD in chamber camera
Hitachi S900
- Cold cathode field emission electron source
- 0.7 nm image resolution at 30 keV and 3 nm at 1 keV
- Magnification from x100 to x800,000
- TEM sample stage allowing W = 5 mm x L = 10 mm x H = 2.5 mm samples
- Turbo pumped column and substrate chambers
- Secondary electron and backscatter detectors
Hitachi S4700
- Field emission electron source
- 1.5 nm image resolution at 15 keV
- Substrates up to 150 mm diameter
- Accelerating voltages from 0.5 to 30 keV in 100 eV steps
- Eucentric 5 axis motorised stage
- Turbomolecular pumped column and sample chamber
- High resolution back scattered detector
- CD measurement and EDX analysis tools
Hitachi S3000
- Pre -centred tungsten hairpin filament
- 3.5 nm image resolution at 25keV
- Substrates up to 150 mm diameter
- Accelerating voltage 0.3 to 30 keV
- 5 axis manual stage operation
- Diffusion pumped column and sample chamber