The University of Glasgow has 20 years experience of nanoimprint lithography, 30 years experience of nanofabrication and is one of the few places in the world that can undertake sub-10 nm electron beam lithography across substrates with dimensions up to 200 mm. Our experience also enables fully integrated devices and circuits along with 3D patterned at the nanoscale.
Most of the research is undertaken by the Micro and Nanotechnology Group - School of Engineering.
We have over 20 years experience of nanoimprint lithography, first using a manual press before commercial tools became available. We now have an Obducat tool which allows samples up to 65 mm to be processed. The system has demonstrated features down to 20 nm and has a 250 oC stage and pneumatic press that can operate up to 70 bar (but normally used at 20 bar). We have significant experience making stamps for the nanoimprinter and Kelvin Nanotechnology also offer stamps up to 200 mm diameter as a commercial service.
A.Z. Khokhar et al. "Nanofabrication of gallium nitride photonic crystal light-emitting diodes" Microelec. Eng. 87, 2200 (2010): doi:10.1016/j.mee.2010.02.003