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The University of Glasgow has 30 years experience of nanofabrication and is one of the few places in the world that can undertake sub-10 nm electron beam lithography and sub-5nm single line nanolithography across substrates with dimensions up to 200 mm. We have propriotary layer-to-layer alignment techniques that can deliver 0.46 nm rms alignment allow reproducible gaps between layers of 1 nm. Our experience also enables fully integrated devices and circuits along with 3D lithographic patterned at the nanoscale.
Most of the research is undertaken by the Micro and Nanotechnology Group - School of Engineering.
The Smallest Electron Beam Lithography Metal Pattern of 3 nm
D.R.S. Cumming et al. "Fabrication of 3 nm wires using 100 keV electron beam lithography and poly(methyl methacrylate) resist" 68, 322 (1996): doi:10.1063/1.116073
Sub 10 nm Electron Beam Lithography
S. Thoms and D. S. Macintyre "Linewidth metrology for sub-10-nm lithography" J. Vac. Sci. Technol. B 28, C6H6 (2010): doi:10.1116/1.3505129
1 nm Gaps Between Metal Electrodes: Beating the Proximity Effect
P. Steinmann and J.M.R. Weaver "Fabrication of sub-5 nm gaps between metallic electrodes using conventional lithographic techniques" J. Vac. Sci. Technol. 22(6), 3178 (2005): doi:110.1116/1.1808712
Picometre Layer-to-layer Alignment
K.E. Docherty et al. "Improvements to the alignment process in a commercial vector scan electron beam lithography tool" Microelec. Eng. 85, 761 (2008): doi:10.1016/j.mee.2008.01.081
Robust Correlation Based Layer-to-layer Alignment
K.E. Docherty et al. "High robustness of correlation-based alignment with Penrose patterns to marker damage in electron beam lithography" Microelec. Eng. 86, 532 (2009): doi:10.1016/j.mee.2008.11.037
Superhydrophobic and Hydrophilic Nanopatterns
E. Martines et al. "Superhydrophobicity and Superhydrophilicity of Regular Nanopatterns" Nano Letters 5, 2097 (2005): doi:10.1021/nl051435t
Cell Scaffolds
M.J. Dalby et al. "Nucleus alignment and cell signaling in fibroblasts: response to a micro-grooved topography" Exp. Cell Research 284, 274 (2003): doi:10.1016/S0014-4827(02)00053-8
Development of Roll-to-roll Nanoimprint Lithography for Cheap Large Area Nanofabrication Manufacturing
A.Z. Khokhar et al. "Nanofabrication of gallium nitride photonic crystal light-emitting diodes" Microelec. Eng. 87, 2200 (2010): doi:10.1016/j.mee.2010.02.003
Magnetic Nanosensors for Rock Analysis
D. Krasa et al. "Nanofabrication of two-dimensional arrays of magnetite particles for fundamental rock magnetic studies" J. Geophysical Research 114, B02104 (2009): doi:10.1029/2008JB006017
Magnetic Nanoelements
X. Liu et al. "Reversal mechanisms and metastable states in magnetic nanoelements" J. Appl. Phys. 96, 5173 (2004): doi:10.1063/1.1803102
Single Carbon Nanotubes for AFM tips
J.P. Edgeworth et al. "Growth and morphology control of carbon nanotubes at the apexes of pyramidal silicon tips" Nanotechnology 21, 105605 (2010): doi:10.1088/0957-4484/21/10/105605
Thermal AFM tips
J.P. Edgeworth et al. "Growth and morphology control of carbon nanotubes at the apexes of pyramidal silicon tips" Nanotechnology 21, 105605 (2010): doi:10.1088/0957-4484/21/10/105605
The smallest gate-length diamond transistor of 50 nm
D.A.J. Moran et al. "Processing of 50 nm gate-length hydrogen terminated diamond FETs for high frequency and high power applications" Microelec. Eng. 8, 1067 (2009): doi:10.1016/j.mee.2010.11.029
10 mm Long Low Loss Silicon Waveguides (loss < 0.9 dB/cm)
M. Gnan et al. "Fabrication of low loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist" Elec. Lett. 44, 115 (2008): doi:10.1049/el:20082985