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Sputter

Plassys MP 900S Sputter Tool

  • Interchangable targets with Ni, Pt, Al, NiCr, Au, Ge, Ti, TaN metals
  • Suitable for samples up to 100 mm
  • Turbo pumped load lock and main chamber
  • 6 magnetron height adjustable cathodes each with screen and pneumatic shutter
  • Substrate double planetary motion
  • 3 off 1.5 kW DC and 3 off 1.0 kW rf power supplies with simultaneous operation
  • Ar, O2 and N2 gas lines with mass flow controllers
  • Full computer control
E-beam

Plassys MEB 400S Electron Beam Evaporator

  • Eight 12cc crucibles with Ni, Pt, Al, NiCr, Au, Ge, Ti, Au metals
  • Suitable for samples up to 100 mm
  • Cryo pumped load lock and main chamber
  • 10 kW electron beam source
  • Substrate double planetary motion
  • Full computer control
E-beam

Plassys MEB 550S Electron Beam Evaporator

  • Eight crucibles with Au, Pd, Al, Mo, Ni, NiCr, Ti, Ge
  • Suitable for substrates up to 150 mm
  • Cryo pumped load lock and main chamber
  • 10 kW electron beam source
  • Load lock chamber
  • Ion gun for substrate cleaning and etching
  • Substrate tilt
  • Full computer control
E-beam

Plassys MEB 400 Evaporator

  • Depositing passivation for diamond electronics
  • Suitable for substrates up to 100 mm
  • Full computer control
Evap

Manual Thermal Evaporator

  • Manual operation
  • Diffusion pumped bell jar
  • 6 thermal sources with ceramic and tungsten boats
Sputter

Plassys MP 600S Confocal Sputter Tool

  • Interchangable targets for Nb-based superconductors
  • Suitable for samples up to 150 mm
  • Cryopumped and turbo pumped main chamber
  • Turbo pumped load lock
  • 6 confocal magnetron sputter sources
  • Substrate heater to 800 oC and rotating substrate
  • DC and rf power supplies with simultaneous operation
  • Ar, O2, N2 and CF4 gas lines with mass flow controllers
  • Full computer control