Plassys MP 900S Sputter Tool
- Interchangable targets with Ni, Pt, Al, NiCr, Au, Ge, Ti, TaN metals
- Suitable for samples up to 100 mm
- Turbo pumped load lock and main chamber
- 6 magnetron height adjustable cathodes each with screen and pneumatic shutter
- Substrate double planetary motion
- 3 off 1.5 kW DC and 3 off 1.0 kW rf power supplies with simultaneous operation
- Ar, O2 and N2 gas lines with mass flow controllers
- Full computer control
Plassys MEB 400S Electron Beam Evaporator
- Eight 12cc crucibles with Ni, Pt, Al, NiCr, Au, Ge, Ti, Au metals
- Suitable for samples up to 100 mm
- Cryo pumped load lock and main chamber
- 10 kW electron beam source
- Substrate double planetary motion
- Full computer control
Plassys MEB 550S Electron Beam Evaporator
- Eight crucibles with Au, Pd, Al, Mo, Ni, NiCr, Ti, Ge
- Suitable for substrates up to 150 mm
- Cryo pumped load lock and main chamber
- 10 kW electron beam source
- Load lock chamber
- Ion gun for substrate cleaning and etching
- Substrate tilt
- Full computer control
Plassys MEB 400 Evaporator
- Depositing passivation for diamond electronics
- Suitable for substrates up to 100 mm
- Full computer control
Manual Thermal Evaporator
- Manual operation
- Diffusion pumped bell jar
- 6 thermal sources with ceramic and tungsten boats
Plassys MP 600S Confocal Sputter Tool
- Interchangable targets for Nb-based superconductors
- Suitable for samples up to 150 mm
- Cryopumped and turbo pumped main chamber
- Turbo pumped load lock
- 6 confocal magnetron sputter sources
- Substrate heater to 800 oC and rotating substrate
- DC and rf power supplies with simultaneous operation
- Ar, O2, N2 and CF4 gas lines with mass flow controllers
- Full computer control
