Plassys MP 900S Sputter Coating Tool
- Interchangable targets with Ni, Pt, Al, NiCr, Au, Ge, Ti, TaN metals
- Suitable for samples up to 100 mm
- Turbo pumped load lock and main chamber
- 6 magnetron height adjustable cathodes each with screen and pneumatic shutter
- Substrate double planetary motion
- 3 off 1.5 kW DC and 3 off 1.0 kW rf power supplies with simultaneous operation
- Ar, O2 and N2 gas lines with mass flow controllers
- Full computer control
Plassys MEB 400S Electron Beam Evaporator
- Eight 12cc crucibles with Ni, Pt, Al, NiCr, Au, Ge, Ti, Au metals
- Suitable for samples up to 100 mm
- Cryo pumped load lock and main chamber
- 10 kW electron beam source
- Substrate double planetary motion
- Full computer control
Plassys MEB 450 Electron Beam Evaporator
- Six crucibles with Pd, NiCr, Au, Ge, Ti, Ni metals
- Suitable for samples up to 75 mm
- Diffusion pumped main chamber
- 10 kW electron beam source
- Load lock chamber
- Plasma system for substrate cleaning
- Full computer control
Manual Thermal Evaporator
- Manual operation
- Diffusion pumped bell jar
- 6 thermal sources with ceramic and tungsten boats
