Home > News > New ICP Reactive Ion Etch Tool

New Oxford Instruments ICP Reactive Ion Etch System

The James Watt Nanofabrication Centre in Glasgow, UK, has added a PlasmaPro System100 ICP plasma etch system to its existing installed base of Oxford Instruments etch and deposition tools. The PlasmaPro System100 ICP will be used to etch compound semiconductors materials used in applications such as optoelectronics, mm-wave & terahertz, bioengineering, biotechnology, lab-on-a-chip, energy harvesting and photovoltaics.


Mark Vosloo, Sales and Marketing Director at Oxford Instruments comments, “As a company Oxford Instruments is committed to developing leading edge tools for research and development, and this additional system order for Oxford Instruments tools emphasises our commitment to providing the research equipment of choice for the University of Glasgow.”

“We have been working closely with Oxford Instruments for many years, utilising their etch and deposition systems successfully for our research.”, said Prof Douglas Paul, Professor of Semiconductor Devices and Director of the James Watt Nanofabrication Centre, “We placed this recent order for an additional Oxford Instruments system as we continue to be impressed by the tools’ flexibility and performance. We have used Oxford tools for many years and continue to use them to develop new etch and deposition processes for nanofabrication as we push technology below 5 nm feature sizes. In addition, maintaining our equipment is vital in order to maximise our usage and investment, and we are extremely satisfied with the consistent high levels of support we receive from Oxford Instruments”

Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology, using innovation to turn smart science into world-class products that support research and industry.

About Oxford Instruments plc

Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. We provide high technology tools and systems for industrial and research markets, based on our ability to analyse and manipulate matter at the smallest scale. Innovation has been the driving force behind Oxford Instruments’ growth and success for over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion.

The first technology business to be spun out from Oxford University over fifty years ago, Oxford Instruments is now a global company with over 1,300 staff worldwide and a listing on the London Stock Exchange (OXIG).

Our objective is to be a leading supplier of next generation tools and systems for research and industry. This involves the combination of core technologies in areas such as low temperature and high magnetic field environments, Nuclear Magnetic Resonance, X-ray electron and optical based metrology, and advanced growth, deposition and etching. Our products, expertise, and ideas address global issues such as energy, environment, terrorism and health and are part of the next generation of telecommunications, energy products, environmental measures, security devices, drug discovery and medical advances.

About Oxford Instruments Plasma Technology

Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for nanometre layer epitaxial growth of compound semiconductor material, etching of nanometre sized features and the controlled growth of nanostructures. These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition and hydride vapour phase epitaxy. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

About the Glasgow James Watt Nanofabrication Centre

The Glasgow James Watt Nanofabrication Centre was built in 2005 bringing together all the nanofabrication tools in the University of Glasgow and is an internationally leading centre in nanofabrication and nanoscale systems. The Centre houses over £20M of nanofabrication and nano-characterisation equipment which is run and maintained in a pseudo-industrial operation by 18 technicians and 4 PhD level research technologists. The University of Glasgow has 30 years of experience of nanofabrication and this now allows patterns, devices and systems all to be fabricated or built with length scales from a few atoms across (about a nanometre) up to many 10s of centimetres.

Glasgow University presently holds the world record for the smallest metal pattern produced by electron beam lithography at 3 nm, the world record for the best layer to layer alignment accuracy (this is 0.46 nm which is 2 silicon atoms and is over 15 times better than anyone else internationally), the fastest mode locked laser at 2.1 THz, the lowest loss silicon waveguides at telecomms wavelengths and up until 2 years ago we held the world record for the fastest transistor. Present research is trying to produce 10 nm gate-length high electron mobility transistors to recover this world record. The Centre has £53M of active research grants and industrial contracts. We collaborate and work with over 50 Scottish, UK and International companies as well as using a University of Glasgow spin-out company, Kelvin Nanotechnology Ltd., to provide industrial access to the facilities at commercial rates. Kelvin Nanotechnology provide industrial access to the facility for a further 200 companies. The companies range from local SMEs up to large multinationals. Further information can be found at http://www.jwnc.gla.ac.uk/